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As announced last week by TSMC, later this year the company is set to start high-volume manufacturing on its N3P fabrication process, and this will be the company's most advanced node for a while. Next year things will get a bit more interesting as TSMC will have two process technologies that could actually compete against each other when they enter high-volume manufacturing (HVM) in the second half of 2025.
Advertised PPA Improvements of New Process Technologies Data announced during conference calls, events, press briefings and press releases |
|||||||||
Compiled by AnandTech |
TSMC | ||||||||
N3 vs N5 |
N3E vs N5 |
N3P vs N3E |
N3X vs N3P |
N2 vs N3E |
N2P vs N3E |
N2P vs N2 |
A16 vs N2P |
||
Power | -25% -30% |
-34% | -5% -10% |
-7%*** | -25% -30% |
-30% -40% |
-5% -10% |
-15% -20% |
|
Performance | +10% +15% |
+18% | +5% | +5% Fmax @1.2V** |
+10% +15% |
+15% +20% |
+5 +10% |
+8% +10% |
|
Density* | ? | 1.3x | 1.04x | 1.10x*** | 1.15x | 1.15x | ? | 1.07x 1.10x |
|
HVM | Q4 2022 |
Q4 2023 |
H2 2024 |
H2 2025 |
H2 2025 |
H2 2026 |
H2 2026 |
H2 2026 |
*Chip density published by TSMC reflects 'mixed' chip density consisting of 50% logic, 30% SRAM, and 20% analog.
**At the same area.
***At the same speed.
The production nodes are N3X (3nm-class, extreme performance-focused) as well as N2 (2nm-class). TSMC says that when compared to N3P, chips made on N3X can either lower power consumption by 7% at the same frequency by lowering Vdd from 1.0V to 0.9V, increase performance by 5% at the same area, or increase transistor density by around 10% at the same frequency. Meanwhile, the key advantage of N3X compared to predecessors is its maximum voltage of 1.2V, which is important for ultra-high-performance applications, such as desktop or datacenter GPUs.
TSMC's N2 will be TSMC's first production node to use gate-all-around (GAA) nanosheet transistors and this will significantly enhance its performance, power, and area (PPA) characteristics. When compared to N3E, semiconductors produced on N3 can cut their power consumption by 25% - 30% (at the same transistor count and frequency), increase their performance by 10% - 15% (at the same transistor count and power), and increase transistor density by 15% (at the same speed and power).
While N2 will certainly be TSMC's undisputed champ when it comes to power consumption and transistor density, N3X could possibly challenge it when it comes to performance, especially at high voltages. For many customers N3X will also have a benefit of using proven FinFET transistors, so N2 will not be automatically the best of TSMC's nodes in the second half of 2025.
In the following year TSMC will again offer two nodes that are set to target generally similar smartphone and high-performance computing applications: N2P (performance-enhanced 2nm-class) and A16 (1.6nm-class with backside power delivery).
N2P is expected to deliver a 5% - 10% lower power (at the same speed and transistor count) or a 5% - 10% higher performance (at the same power and transistor count) compared to the original N2. Meanwhile, A16 is set to offer an up to 20% lower power (at the same speed and transistors), up to 10% higher performance (at the same power and transistors), and up to 10% higher transistor density compared to N2P.
Keeping in mind that A16 features enhanced backside power delivery network, it will likely be the node of choice for performance-minded chip designers. But of course, it will be more expensive to use A16 because of the backside power delivery, which requires additional process steps.
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Un nouveau cap vient d'être franchi au niveau du meilleur prix en France sur une NVIDIA GeForce RTX 4070 SUPER : seulement 579,99 € ce qui commence à devenir très intéressant sur un tel modèle. La carte dont nous parlons est donc la PNY GeForce RTX 4070 SUPER VERTO OC. Il s'agit clairement d'un modè...
At its European Technology Symposium last week TSMC revealed some of the details about its Global Gigafab Manufacturing program, the company's strategy to replicate its manufacturing processes across its multiple gigafab sites.
The need for large-scale multi-national fabs to have a process in place to replicate their facilities is well-documented at this point. As scaling-up at at the gigafab size means scaling-out instead, chip makers need to be able to quickly get new and updated manufacturing processes ported to other facilities in order to hit their necessary throughput – and to avoid a multi-quarter bottlenecks that come from having to freshly-tune a fab.
Intel, for their part, has a well-known Copy Exactly program, which is one of the company's major competitive advantages, allowing it to share process recipes across its fabs around the world to maximize yields and reduce performance variability. Meanwhile, as Taiwan Semiconductor Manufacturing Co. is building additional capacity in different parts of the world, it has reached the point where it needs a similar program in order to quickly maximize its yields and productivity at its new fabs in Japan and the U.S. And in some respects, TSMC's program goes even further than Intel's, with an additional focus on sustainability and social responsibility.
"As mentioned at last year's symposium, [Global Gigafab manufacturing] is a powerful global manufacturing and management platform," said Y.L. Wang, Vice President of Fab Operations TSMC. "We realise one fab management to ensure our Gigafab to achieve consistent operation efficiency as well as production quality on a global scale. Moreover, we also pursue sustainability across our global footprint covering green manufacturing, global talent development, supply chain localization, as well as social responsibility."
TSMC's Global GigaFab Manufacturing Data by TSMC (Compiled by AnandTech) |
|||
Manufacturing Excellence | Sustainability | ||
Global One Fab Manufacturing | Green Manufacturing | ||
ML-based Process Control | Global Talent Development | ||
Manufacturing Agility and Quality | Supply Chain Localization | ||
Maximum Productivity | Social Responsibility |
When it comes to improvements of process technology, there are two main mechanisms: the continuous process improvements (CPI) to improve yields, as well as statistical process control (SPC) reduce performance variations. To do so, the company has multiple internal techniques that rely on machine learning-based process control, constant quality measuring, and various productivity improving methods. With Global Gigafab manufacturing TSMC can use CPI and SPC to improve yields and performance on the global scale by sharing knowledge between different sites.
"When we port a technology from Taiwan to Arizona, the fab set up, the process control system, everything is actually a copy from Taiwan," said Kevin Zhang, Senior Vice President, Business Development and Overseas Operations Office, and Deputy Co-COO at TSMC.
TSMC yet has to start making chips at its fabs in Germany, Japan, and the United States, so it remains to be seen how fast the foundry will increase yields to Taiwanese levels at its Fab 23 (in Kumamoto, Japan) and Fab 21 (in Arizona) when they begin operations in 2024 and 2025, but with Global Gigafab Manufacturing program in place, this is likely set to happen rather sooner than later.