Although TSMC can't claim to be the first fab to use extreme UV (EUV) lithography – that title goes to Samsung – they do get to claim to be the largest. As a result, the company has developed significant experience with EUV over the years, allowing TSMC to refine how they use EUV tooling to both improve productivity/uptime, and to cut down on the costs of using the ultra-fine tools. As part of the company's European Technology Symposium this week, they went into a bit more detail on their EUV usage history, and their progress on further integrating EUV into future process nodes.

When TSMC started making chips using EUV lithography in 2019 on its N7+ process (for Huawei's HiSilicon), it held 42% of the world's installed base of EUV tools, and even as ASML ramped up shipments of EUV scanners in 2020, TSMC's share of EUV installations actually increased to 50%. And jumping ahead to 2024, where the number of EUV litho systems at TSMC has increased by 10-fold from 2019, TSMC is now 56% of the global EUV installed base, despite Samsung and Intel ramping up their own EUV production. Suffice it to say, TSMC made a decision to go in hard on EUV early on, and as a result they still have the lion's share of EUV scanners today.

Notably, TSMC's EUV wafer production has increased by an even larger factor; TSMC now pumps out 30 times as many EUV wafers as they did in 2019. Compared to the mere 10x increase in tools, TSMC's 30x jump in production underscores how TSMC has been able to increase their EUV productivity, reduce service times, and fewer tool downtimes overall. Apparently, this has all been accomplished using the company's in-house developed innovations.

TSMC says that it has managed to increase wafer-per-day-per-tool productivity of its EUV systems by two times since 2019. To do so, the company optimized the EUV exposure dose and the photoresist it uses. In addition, TSMC greatly refined its pellicles for EUV reticles, which increased their lifespan by four times (i.e., increases uptime), increased output per pellicle by 4.5 times, and lowered defectivity by massive 80 times (i.e., improves productivity and increases uptime). For obvious reasons, TSMC does not disclose how it managed to improve its pellicle technology so significantly, but perhaps over time the company's engineers are going to share this with academia. 

EUV lithography systems are also notorious for their power consumption. So, in addition to improving productivity of EUV tools, the company also managed to reduce the power consumption of its EUV scanners by 24% through undisclosed 'innovative energy saving techniques.' And the company isn't done there: they are planning to improve energy efficiency per wafer per EUV tool by 1.5 times by 2030.

Considering all the refinements that TSMC has managed to achieve with Low-NA EUV lithography by now, it is not terribly surprising that the company is quite confident that it can continue to produce cutting-edge chips in the future. Whereas rival Intel has gone all-in on High-NA EUV for their future, sub-18A nodes, TSMC is looking to leverage their highly-optimized and time-tested Low-NA EUV tooling instead, avoiding the potential pitfalls of a major technology transition so soon while also reaping the cost benefits of using the well-established tooling.

With all the new fabs being built in Germany and Japan, as well as the expansion of production capacity in China, TSMC is planning to extend its production capacity for specialty technologies by 50% by 2027. As disclosed by the company during its European Technology Symposium this week, TSMC expects to need to not only convert existing capacity to meet demands for specialty processes, but even build new (greenfield) fab space just for this purpose. One of the big drivers for this demand, in turn, will be TSMC's next specialty node: N4e, a 4nm-class ultra-low-power production node.

"In the past, we always did the review phase [for upcoming fabs], but for the first time in a long time at TSMC, we started building greenfield fab that will address the future specialty technology requirements," said Dr. Kevin Zhang, Senior Vice President, Business Development and Overseas Operations Office, at the event. "In the next four to five years, we actually going to grow our specialty capacity by up to 1.5x. In doing so we actually expanding the footprint of our manufacturing network to improve the resiliency of the overall fab supply chain."

On top of its well-known major logic nodes like N5 and N3E, TSMC also offers a suite of specialty nodes for applications such as power semiconductors, mixed analog I/O, and ultra-low-power applications (e.g. IoT). These are typically based on the company's trailing manufacturing processes, but regardless of the underlying technology, the capacity demand for these nodes is growing right alongside the demand for TSMC's major logic nodes. All of which has required TSMC to reevaluate how they go about planning for capacity on their specialty nodes.

TSMC's expansion strategy in the recent years has pursued several goals. One of them has been to build new fabs outside of Taiwan; another has been to generally expand production capacity to meet future demand for all types of process technologies – which is why the company is building up capacity for specialty nodes.

At present, TSMC's most advanced specialty node is N6e, an N7/N6 variant that supports operating voltages between 0.4V and 0.9V. With N4e, TSMC is looking at voltages below 0.4V. Though for now, TSMC is not disclosing much in the way of technical details for the planned node; given the company's history here, we expect they'll have more to talk about next year once the new process is ready.

Of the several major changes coming with HBM4 memory, one of the most immediate is the sheer width of the memory interface. With the fourth-generation memory standard moving from an already wide 1024-bit interface to a ultra-wide 2048-bit interface, HBM4 memory stacks won't be business as usual; chip manufacturers are going to need to adopt more advanced packaging methods than are used today to accommodate the wider memory.

As part of its European Technology Symposium 2024 presentation, TSMC offered some fresh details into the base dies it will be manufacturing for HBM4, which will be built using logic processes. With TSMC planning to employ variations of their N12 and N5 processes for this task, the company is expecting to occupy a favorable place in the HBM4 manufacturing process, as memory fabs are not currently equipped to economically produce such advanced logic dies – if they can produce them at all.

For the first wave of HBM4, TSMC is preparing to use two fabrication processes: N12FFC+ and N5. While they serve the same purpose — integrating HBM4E memory with next-generation AI and HPC processors — they are going to be used in two different ways to connect memory for high-performance processors for AI and HPC applications.

"We are working with key HBM memory partners (Micron, Samsung, SK Hynix) over advanced nodes for HBM4 full stack integration," said Senior Director of Design and Technology Platform at TSMC. "N12FFC+ cost effective base die can reach HBM for performance and N5 base die can provide even more logic with much lower power at HBM4 speeds."

TSMC's base die made on N12FFC+ fabrication process (12nm FinFet Compact Plus, which formally belongs to a 12nm-class technology, but it lays its roots from TSMC's well-proven 16nm FinFET production node) will be used to install HBM4 memory stacks on a silicon interposer next to system-on-chips (SoCs). TSMC believes that their 12FFC+ process is well-suited to achieve HBM4 performance, enabling memory vendors to build 12-Hi(48 GB) and 16-Hi stacks (64 GB), with per-stack bandwidth well as over 2 TB/second. 

"We are also optimizing CoWoS-L and CoWoS-R for HBM4," the Senior Director said. "Both CoWoS-L and CoWoS-R [use] over eight layers to enable HBM4's routing of over 2,000 interconnects with [proper] signal integrity."

HBM4 base dies on N12FFC+ will be instrumental in building system-in-packages (SiPs) using TSMC's CoWoS-L or CoWoS-R advanced packaging technology, which offer interposers up to 8x reticle size – enough space for up to 12 HBM4 memory stacks. At present, HBM4 can achieve data transfer rates of 6 GT/s at currents of 14mA, according to TSMC figures.

"We collaborate with EDA partners like Cadence, Synopsys, and Ansys to certify HBM4 channel signal integrity, IR/EM, and thermal accuracy," the TSMC representative explained.

Meanwhile, as an even more advanced alternative, memory manufacturers will also have the option of tapping TSMC's N5 process for their HBM4 base dies. N5-built base dies will pack even more logic, consume less power, and will offer even higher performance. But arguably the most important benefit is that such an advanced process technology will enable are very small interconnect pitches, on the order of 6 to 9 microns. This will allow N5 base dies to be used in conjunction with direct bonding, enabling HBM4 to be 3D stacked right on top of logic chips. Direct bonding stands to allow for even greater memory performance, which is expected to be a big boost for AI and HPC chips that are always scrounging for more memory bandwidth.

We already know that TSMC and SK Hynix collaborate on HBM4 base dies. It is likely that TSMC will also produce HBM4 base dies for Micron. Otherwise, we'd be more surprised to see TSMC working with Samsung, as that conglomerate already has its own advanced logic fabs via its Samsung Foundry unit.

As part of the second leg of TSMC's spring technology symposium series, the company offered an update on the state of its 3nm-class processes, both current and future. Building on the back of their current-generation N3E process, the optical shrink of this process technology, N3P, is now on track to enter mass production in the second half of 2024. Thanks to that shrink, N3P is expected to offer both increased performance efficiency as well as increased transistor density over N3E.

N3E in Production, Yielding Well

With N3E already in volume production, TSMC is reporting that they're seeing "great" yields on the second-generation 3nm-class process note. According to the company, the D0 defect density of N3E is at relative parity with N5, matching the defect rate of the older node for the same point in its respective lifecycle. This is no small feat, given the additional complexities that come with developing one last, ever-finer generation of FinFET technology. So for TSMC's bleeding-edge customers such as Apple, who just launched their M4 SoC, this is allowing them to reap the benefits of the improved process node relatively quickly.

"N3E started volume production in the fourth quarter of last year, as planned," a TSMC executive said at the event. "We have seen great yield performance on customers' products, so they did go to market as planned."

TSMC's N3E node is a relaxed version of N3B, eliminating some EUV layers and completely avoiding the usage of EUV double patterning. This makes it a bit cheaper to produce, and in some cases it widens the process window and yields, though it comes at the cost of some transistor density.

N3P on Track For Second-Half 2024

Meanwhile, looking towards the immediate future at TSMC, N3P has finished qualification and its yield performance is close to N3E, according to the company. Being an optical shrink, the N3P node is set to enable processor developers to either increase performance by 4% at the same leakage or reduce power consumption by 9% at the same clocks (previously the range was between 4% ~ 10% depending on design). The new node is also set to boost transistor density by 4% for a 'mixed' chip design, which TSMC defines as a processor consisting of 50% logic, 30% SRAM, and 20% analog circuits.

While it looks like the original N3 (aka N3B) will have a relatively muted lifecycle since Apple has been its only major customer, N3E will be adopted by a wide range of TSMC's customers, which includes many of the industry's biggest chip designers. 

Since N3P is an optical shrink of N3E, it is compatible with its predecessor in terms of IP blocks, process rules, electronic design automation (EDA) tools, and design methodology. As a result, TSMC expects the majority of new tape outs to use N3P, not N3E or N3. This is logical as N3P provides higher performance efficiency than N3E at a lower cost than N3.

The most important aspect of N3P is that it is on track to be production ready in the second half of this year, so expect chip designers to adopt it straight away. 

"We have also successfully delivered N3P technology," the TSMC executive said. "It has passed qualification and yield performance is close to N3E. [The process technology] has also received product customer tape outs and will start on production in the second half of this year. Because of [PPA advantages] of N3P, we expect the majority of tape outs on N3 to go to N3P."

This week Samsung Electronics and Synopsys announced that Samsung has taped out its first mobile system-on-chip on Samsung Foundry's 3nm gate-all-around (GAA) process technology. The announcement, coming from electronic design automation Synopsys, further notes that Samsung used the Synopsys.ai EDA suite to place-n-route the layout and verify design of the SoC, which in turn enabled higher performance.

Samsung's unnamed high-performance mobile SoC relies on 'flagship' general-purpose CPU and GPU architectures as well as various IP blocks from Synopsys. SoC designers used Synopsys.ai EDA software, including the Synopsys DSO.ai to fine-tune design and maximize yields as well as Synopsys Fusion Compiler RTL-to-GDSII solution to achieve higher performance, lower power, and optimize area (PPA).

And while the news that Samsung has developed a high-performance SoC using the Synopsys.ai suite is important, there is another, even more important dimension to this announcement: this means that Samsung has finally taped out an advanced smartphone application processor on its cutting-edge 3nm GAAFET process.

Although Samsung Foundry has been producing chips on its GAA-equipped SF3E (3 nm-class, 'early' node) process for almost two years now, Samsung Electronics has never used this technology for its own system-on-chips for smartphones or other complex devices. To date, SF3E has been used mainly for cryptocurrency mining chips, presumably due to the inevitable early teething and yield issues that come with being the industry's first commercial GAAFET process.

For now, Samsung isn't disclosing what specific process node is being used for the SoC; the official Samsung/Synposys announcement only notes that it's for a GAA process node. Along with their first-generation 3nm-class SF3E, Samsung Foundry has a considerably more sophisticated SF3 manufacturing technology that offers numerous improvements over SF3E, and is due to be used for mass production in the coming quarters. Given the timing of the announcement, the reasonable bet is that they're using SF3.

As for Samsung's tooling partnership with Synopsys, the latter's tools are being credited for delivering some significant performance improvements to the chip's design. In particular, the two firms are crediting those tools for improving the chip's peak clockspeed by 300MHz while cutting down on dynamic power usage by 10%. To accomplish that, Samsung Electronics' SoC developers used design partitioning optimization, multi-source clock tree synthesis (MSCTS), and smart wire optimization to reduce signal interference, along with a simpler hierarchical approach. And by using Synopsys Fusion Compiler, they did all this while being able to skip weeks of 'manual' design work, according to the joint press release.

"Our longstanding collaboration has delivered leading-edge SoC designs," said Kijoon Hong, vice president of SLSI at Samsung Electronics. "This is a remarkable milestone to successfully achieve the highest performance, power and area on the most advanced mobile CPU cores and SoC designs in collaboration with Synopsys. Not only have we demonstrated that AI-driven solutions can help us achieve PPA targets for even the most advanced GAA process technologies, but through our partnership we have established an ultra-high-productivity design system that is consistently delivering impressive results."

As part of Samsung's Q1 earnings announcement, the company has outlined some of its foundry unit's key plans for the rest of the year. The company has confirmed that it remains on track to meeting its goal of starting mass production of chips on its SF3 (3 nm-class, 2nd Generation) technology in the second half of the year. Meanwhile in June, Samsung Foundry will formally unveil its SF2 (2 nm-class) process technology, which will offer a mix of performance and efficiency enhancements. Finally, the company the company is preparing a variation of its 4 nm-class technology for integration into stacked 3D designs.

SF2 To Be Unveiled In June

Samsung plans to disclose key details about its SF2 fabrication technology at the VLSI Symposium 2024 on June 19. This will be the company's second major process node based upon gate-all-around (GAA) multi-bridge channel field-effect transistors (MBCFET). Improving over its predecessor, SF2 will feature a 'unique epitaxial and integration process,' which will give the process node higher performance and lower leakage than traditional FinFET-based nodes (though Samsung isn't disclosing the specific node they're comparing it to).

Samsung says that SF2 increases performance of narrow transistors by 29% for N-type and 46% for P-type, and wide transistors by 11% and 23% respectively. Moreover, it reduces transistor global variation by 26% compared to FinFET technology, and cuts product leakage by approximately 50%. This process also sets the stage for future advancements in technology through enhanced design technology co-optimization (DTCO) collaboration with its customers.

One thing that Samsung has not mentioned in context of SF2 is backside power delivery, so at least for the moment, there is no indication that Samsung will be adopting this next-gen power routing feature for SF2.

Samsung says that the design infrastructure for SF2 – the PDK, EDA tools, and licensed IP – will be finalized in the second quarter of 2024. Once this happens, Samsung's chip development partners will be able to begin designing products for this production node. Meanwhile, Samsung is already working with Arm to co-optimize Arm's Cortex cores for the SF2 process.

SF3: On Track for 2H 2024

As the first fab to introduce a GAAFET-based node, Samsung has been on the cutting edge of chip construction. At the same time, however, that has also meant that they're the first fab to encounter and solve the inevitable teething issues that come with such a major transistor design change. Consequently, while Samsung's first-generation SF3E process technology has been in production for a little less than two years now, the only publicly-disclosed chips made on the process so far have been relatively small cryptocurrency mining chips – exactly the kind of pipecleaner parts that do well on a new process node.

But with that experience in hand, Samsung is preparing to move on to making bigger and better chips with GAAFETs. As part of their earnings announcements, the company has confirmed that their updated SF3 node, which was introduced last year, remains on schedule to enter production in the second half of 2024.

A more mature product from the get-go, SF3 is being prepared to be used for building larger processors, including datacenter products. Compared to its direct predecessor, SF4, SF3 promises a 22% performance boost at the same power and transistor count, or a 34% lower power at the same frequency and complexity, as well as a 21% logic area reduction. In general, Samsung pins a lot of hopes on this technology, as it's this generation of their 3nm-class technology that is poised to compete against TSMC's N3B and N3E nodes.

SF4: Ready for 3D Stacking

Finally, Samsung is also preparing a variant of their final FinFET technology node, SF4, for use in 3D chiplet stacking. As transistor density improvements have continued to slow, 3D chip stacking has emerged as a way to keep boosting overall chip performance, especially with modern, multi-tile processor designs.

Details on this node are limited, but it would seem that Samsung is making some changes to account/optimize for using SF4-fabbed chiplets in a 3D-stacked design, where chips need to be able to communicate both up and down. According to the company's Q1 financial report, Samsung expects to complete their preparatory work on the chip-stacking SF4 variant during the current quarter (Q2).

Sources: Samsung, Samsung

TSMC is no stranger to building big chips. Besides the ~800mm2 reticle limit of their normal logic processes, the company already produces even larger chips by fitting multiple dies on to a single silicon interposer, using their chip-on-wafer-on-substrate (CoWoS) technology. But even with current-gen CoWoS allowing for interposers up to 3.3x TSMC's reticle limit, TSMC plans to build bigger still in response to projected demand from the HPC and AI industries. To that end, as part of the company's North American Technology Symposium last week, TSMC announced that they are developing the means of building super-sized interposers that can reach over 8x the reticle limit.

TSMC's current-generation CoWoS technology allows for building interposers up to 2831 mm² and the company is already seeing customers come in with designs that run up to those limits. Both AMD's Instinct MI300X accelerator and NVIDIA's forthcoming B200 accelerator are prime examples of this, as they pack huge logic chiplets (3D stacked in case of AMD's product) and eight HBM3/HBM3E memory stacks in total. The total space afforded by the interposer gives these processors formidable performance, but chip developers want to go more powerful still. And to get there as quickly as possible, they'll need to go bigger as well in order to incorporate more logic chiplets and more memory stacks.

For their next-generation CoWoS product that's set to launch in 2026, TSMC plans to release CoWoS_L, which will offer a maximum interposer size of approximately 5.5 times that of a photomask, totaling 4719 mm² altogether. This next generation package will support up to 12 HBM memory stacks and will necessitate a larger substrate measuring at 100×100 mm. Coupled with process node improvements over the next few years, and TSMC expects chips based on this generation of CoWoS to offer better than 3.5x the compute performance of current-generation CoWoS chips.

Farther down the line, in 2027 TSMC intends introduce a version of CoWoS that allows for interposers up to 8 times larger than the reticle limit. This will offer an ample 6,864 mm² of space for chiplets on a substrate that measures 120×120 mm. TSMC envisions leveraging this technology for designs that integrate four stacked systems-on-integrated chips (SoICs), with 12 HBM4 memory stacks and extra I/O dies. TSMC roughly projects that this will enable chip designers to once again double performance, producing chips that surpass 7x the performance of current-generation chips.

Of course, building such large chips will come with its own set of consequences, above and beyond what TSMC will have to deal with. Enabling chip designers to build such grand processors is going to impact system design, as well as how datacenters accommodate these systems. TSMC's 100×100mm substrate will be riding right up to the limit of the OAM 2.0 form factor, whose modules measure 102×165mm to begin with. And if that generation of CoWoS doesn't break the current OAM form factor, then 120×120mm chips certainly will. And, of course, all of that extra silicon requires additional power and cooling, which is why we're already seeing hardware vendors prepare for how to cool multi-kilowatt chips by investigating liquid and immersion cooling.

Ultimately, even if Moore's Law has slowed to a crawl in terms of delivering transistor density improvements, CoWoS offers an out for producing chips with an ever-larger number of transistors. So with TSMC set to offer interposers and substrates with over twice the area of today's solutions, big chips intended for HPC systems are only going to continue to grow in both performance and size.

Related Reading

• TSMC's 1.6nm Technology Announced for Late 2026: A16 with "Super Power Rail" Backside Power
• TSMC 2nm Update: N2 In 2025, N2P Loses Backside Power, and NanoFlex Brings Optimal Cells
• TSMC Preps Cheaper 4nm N4C Process For 2025, Aiming For 8.5% Cost Reduction
• TSMC's System-on-Wafer Platform Goes 3D: CoW-SoW Stacks Up the Chips
• TSMC Jumps Into Silicon Photonics, Lays Out Roadmap For 12.8 Tbps COUPE On-Package Interconnect

Optical connectivity – and especially silicon photonics – is expected to become a crucial technology to enable connectivity for next-generation datacenters, particularly those designed HPC applications. With ever-increasing bandwidth requirements needed to keep up with (and keep scaling out) system performance, copper signaling alone won't be enough to keep up. To that end, several companies are developing silicon photonics solutions, including fab providers like TSMC, who this week outlined its 3D Optical Engine roadmap as part of its 2024 North American Technology Symposium, laying out its plan to bring up to 12.8 Tbps optical connectivity to TSMC-fabbed processors.

TSMC's Compact Universal Photonic Engine (COUPE) stacks an electronics integrated circuit on photonic integrated circuit (EIC-on-PIC) using the company's SoIC-X packaging technology. The foundry says that usage of its SoIC-X enables the lowest impedance at the die-to-die interface and therefore the highest energy efficiency. The EIC itself is produced at a 65nm-class process technology.

TSMC's 1st Generation 3D Optical Engine (or COUPE) will be integrated into an OSFP pluggable device running at 1.6 Tbps. That's a transfer rate well ahead of current copper Ethernet standards – which top out at 800 Gbps – underscoring the immediate bandwidth advantage of optical interconnects for heavily-networked compute clusters, never mind the expected power savings.

Looking further ahead, the 2nd Generation of COUPE is designed to integrate into CoWoS packaging as co-packaged optics with a switch, allowing optical interconnections to be brought to the motherboard level. This version COUPE will support data transfer rates of up to 6.40 Tbps with reduced latency compared to the first version.

TSMC's third iteration of COUPE – COUPE running on a CoWoS interposer – is projected to improve on things one step further, increasing transfer rates to 12.8 Tbps while bringing optical connectivity even closer to the processor itself. At present, COUPE-on-CoWoS is in the pathfinding stage of development and TSMC does not have a target date set.

Ultimately, unlike many of its industry peers, TSMC has not participated in the silicon photonics market up until now, leaving this to players like GlobalFoundries. But with its 3D Optical Engine Strategy, the company will enter this important market as it looks to make up for lost time.

Related Reading

• TSMC's 1.6nm Technology Announced for Late 2026: A16 with "Super Power Rail" Backside Power
• TSMC 2nm Update: N2 In 2025, N2P Loses Backside Power, and NanoFlex Brings Optimal Cells
• TSMC Preps Cheaper 4nm N4C Process For 2025, Aiming For 8.5% Cost Reduction
• TSMC's System-on-Wafer Platform Goes 3D: CoW-SoW Stacks Up the Chips

TSMC has been offering its System-on-Wafer integration technology, InFO-SoW, since 2020. For now, only Cerebras and Tesla have developed wafer scale processor designs using it, as while they have fantastic performance and power efficiency, wafer-scale processors are extremely complex to develop and produce. But TSMC believes that not only will wafer-scale designs ramp up in usage, but that megatrends like AI and HPC will call for even more complex solutions: vertically stacked system-on-wafer designs.

Tesla Dojo's wafer-scale processors — the first solutions based based on TSMC's InFO-SoW technology that are in mass production — have a number of benefits over typical system-in-packages (SiPs), including low-latency high-bandwidth core-to-core communications, very high performance and bandwidth density, relatively low power delivery network impendance, high performance efficiency, and redunancy.

But with InFO-SoW and other wafer scale integration methods, processor designers have to rely solely on on-chip memory. This is perfectly adequate for many applications, but it may not be enough for next-generation AI workloads. Furthermore, with InFO-SoW, the whole wafer has to be processed using one fabrication technology, which may not be optimal, or too expensive for certain designs.

So, with its next-generation system-on-wafer platform, TSMC plans to bring together two of its packaging technologies: InFO-SoW and System on Integrated Chips (SoIC), which will allow it to stack memory or logic on top of a system-on-wafer using its Chip-on-Wafer (CoW) method. The CoW-SoW technology, which the company announced at its North American Technology Symposium, will be ready for mass production in 2027.

For now, TSMC is mostly talking about wedding wafer scale processors with HBM4 memory. And given that HBM4 stacks will feature a 2048-bit interface, its tighter integration with logic is something that the industry is considering.

"So, in the future, using wafer level integrations [will allow] our customers to integrate even more logic and memory together," said Kevin Zhang, Vice President of Business Development at TSMC. "SoW is no longer a fiction, this is something we already work with our customers [on] to produce some of the products already in place. This we think by leveraging our advanced wafer level integration technology, we can provide our customer a very important the path allow them to continue to grow their capability to bring in more computation, more energy efficient computation, to their AI cluster or [supercomputer]."

Related Reading

• TSMC's 1.6nm Technology Announced for Late 2026: A16 with "Super Power Rail" Backside Power
• TSMC 2nm Update: N2 In 2025, N2P Loses Backside Power, and NanoFlex Brings Optimal Cells
• TSMC Preps Cheaper 4nm N4C Process For 2025, Aiming For 8.5% Cost Reduction

While the bulk of attention on TSMC is aimed at its leading-edge nodes, such as N3E and N2, loads of chips will continue to be made using more mature and proven process technologies for years to come. Which is why TSMC has continued to refine its existing nodes, including its current-generation 5nm-class offerings. To that end, at its North American Technology Symposium 2024, the company introduced a new, optimized 5nm-class node: N4C.

TSMC's N4C process belongs to the company's 5nm-class family of fab nodes and is a superset of N4P, the most advanced technology in that family. In a bid to further bring down 5nm manufacturing costs, for TSMC is implementing several changes for N4C, including rearchitecting their standard cell and SRAM cell, changing some design rules, and reducing the number of masking layers. As a result of these improvements, the company expects N4C to achieve both smaller die sizes as well as a reduction in production complexity, which in turn will bring die costs down by up to 8.5%. Furthermore, with the same wafer-level defect density rate as N4P, N4C stands to offer even higher functional yields thanks to its die area reduction.

"So, we are not done with our 5nm and 4nm [technologies]," said Kevin Zhang, Vice President of Business Development at TSMC. "From N5 to N4, we have achieved 4% density improvement optical shrink, and we continue to enhance the transistor performance. Now we bring in N4C to our 4 nm technology portfolio. N4C allows our customers to reduce their costs by remove some of the masks and to also improve on the original IP design like a standard cell and SRAM to further reduce the overall product level cost of ownership."

TSMC says that N4C can use the same design infrastructure as N4P, though it is unclear whether N5 and N4P IP can be re-used for N4C-based chips. Meanwhile, TSMC indicates that it offers various options for chipmakers to find the right balance between cost benefits and design effort, so companies interested in adopting a 4nm-class process technologies could well adopt N4C.

The development of N4C comes as many of TSMC's chip design customers are preparing to launch chips based on the company's final generation of FinFET process technology, the 3nm N3 series. While N3 is expected to be a successful family, the high costs of N3B have been an issue, and the generation is marked by diminishing performance and transistor density returns altogether. Consequently, N4C could well become a major, long-lived node at TSMC, serving as a good fit for customers who want to stick to a more cost-effective FinFET node.

"This is a very significant enhancement, we are working with our customer, basically to extract more value from their 4 nm investment," Zhang said.

TSMC expects to start volume production of N4C chips some time next year. And with TSMC having produced 5nm-class for nearly half a decade at that point, N4C should be able to hit the ground running in terms of volume and yields.

Related Reading

• TSMC's 1.6nm Technology Announced for Late 2026: A16 with "Super Power Rail" Backside Power
• TSMC 2nm Update: N2 In 2025, N2P Loses Backside Power, and NanoFlex Brings Optimal Cells
• TSMC's System-on-Wafer Platform Goes 3D: CoW-SoW Stacks Up the Chips
• TSMC Jumps Into Silicon Photonics, Lays Out Roadmap For 12.8 Tbps COUPE On-Package Interconnect

Taiwan Semiconductor Manufacturing Co. provided several important updates about its upcoming process technologies at its North American Technology Symposium 2024. At a high level, TSMC's 2 nm plans remain largely unchanged: the company is on track to start volume production of chips on it's first-generation GAAFET N2 node in the second half of 2025, and N2P will succeed N2 in late 2026 – albeit without the previously-announced backside power delivery capabilities. Meanwhile, the whole N2 family will be adding TSMC's new NanoFlex capability, which allows chip designers to mix and match cells from different libraries to optimize performance, power, and area (PPA). 

One of the key announcements of the event is TSMC's NanoFlex technology, which will be a part of the company's complete N2 family of production nodes (2 nm-class, N2, N2P, N2X). NanoFlex will enable chip designers to mix and match cells from different libraries (high performance, low power, area efficient) within the same block design, allowing designers to fine tune their chip designs to improve performance or lower power consumption.

TSMC's contemporary N3 fabrication process already supports a similar capability called FinFlex, which also allows designers to use cells from different libraries. But since N2 relies on gate-all-around (GAAFET) nanosheet transistors, NanoFlex gives TSMC some additional controls: firstly, TSMC can optimize channel width for performance and power and then build short cells (for area and power efficiency) or tall cells (for up to 15% higher performance).  

When it comes to timing, TSMC's N2 is set to enter risk production in 2025 and high-volume manufacturing (HVM) in the second half of 2025, so it looks like we are going to see N2 chips in retail devices in 2026. Compared to N3E, TSMC expects N2 to increase performance by 10% to 15% at the same power, or reduce power consumption by 25% to 30% at the same frequency and complexity. As for chip density, the foundry is looking at a 15% density increase, which is a good degree of scaling by contemporary standards.

N2 will be followed by performance-enhanced N2P, as well as the voltage-enhanced N2X in 2026. Although TSMC once said that N2P would add backside power delivery network (BSPDN) in 2026, it looks like this will not be the case and N2P will use regular power delivery circuitry. The reason for this is unclear, but it looks like the company decided not to add a costly feature to N2P, but to reserve it to its next-generation node, which will also be available to customers in late 2026.

N2 is still expected to feature a major innovation related to power: super-high-performance metal-insulator-metal (SHPMIM) capacitors, which are are being added to improve power supply stability. The SHPMIM capacitor offers more than twice the capacity density of TSMC's existing super-high-density metal-insulator-metal (SHDMIM) capacitor. Additionally, the new SHPMIM capacitor cuts sheet resistance (Rs in Ohm/square) and via resistance (Rc) by 50% compared to its predecessor.

Related Reading

• TSMC's 1.6nm Technology Announced for Late 2026: A16 with "Super Power Rail" Backside Power
• TSMC Preps Cheaper 4nm N4C Process For 2025, Aiming For 8.5% Cost Reduction
• TSMC's System-on-Wafer Platform Goes 3D: CoW-SoW Stacks Up the Chips
• TSMC Jumps Into Silicon Photonics, Lays Out Roadmap For 12.8 Tbps COUPE On-Package Interconnect

With the arrival of spring comes showers, flowers, and in the technology industry, TSMC's annual technology symposium series. With customers spread all around the world, the Taiwanese pure play foundry has adopted an interesting strategy for updating its customers on its fab plans, holding a series of symposiums from Silicon Valley to Shanghai. Kicking off the series every year – and giving us our first real look at TSMC's updated foundry plans for the coming years – is the Santa Clara stop, where yesterday the company has detailed several new technologies, ranging from more advanced lithography processes to massive, wafer-scale chip packing options.

Today we're publishing several stories based on TSMC's different offerings, starting with TSMC's marquee announcement: their A16 process node. Meanwhile, for the rest of our symposium stories, please be sure to check out the related reading below, and check back for additional stories.

• TSMC's 1.6nm Technology Announced for Late 2026: A16 with "Super Power Rail" Backside Power
• TSMC 2nm Update: N2 In 2025, N2P Loses Backside Power, and NanoFlex Brings Optimal Cells
• TSMC Preps Cheaper 4nm N4C Process For 2025, Aiming For 8.5% Cost Reduction
• TSMC's System-on-Wafer Platform Goes 3D: CoW-SoW Stacks Up the Chips
• TSMC Jumps Into Silicon Photonics, Lays Out Roadmap For 12.8 Tbps COUPE On-Package Interconnect
• TSMC Readies 8x Reticle Super Carrier Interposer For Next-Gen Chips Twice as Large As Today's

Headlining its Silicon Valley stop, TSMC announced its first 'angstrom-class' process technology: A16. Following a production schedule shift that has seen backside power delivery network technology (BSPDN) removed from TSMC's N2P node, the new 1.6nm-class production node will now be the first process to introduce BSPDN to TSMC's chipmaking repertoire. With the addition of backside power capabilities and other improvements, TSMC expects A16 to offer significantly improved performance and energy efficiency compared to TSMC's N2P fabrication process. It will be available to TSMC's clients starting H2 2026.

TSMC A16: Combining GAAFET With Backside Power Delivery

At a high level, TSMC's A16 process technology will rely on gate-all-around (GAAFET) nanosheet transistors and will feature a backside power rail, which will both improve power delivery and moderately increase transistor density. Compared to TSMC's N2P fabrication process, A16 is expected to offer a performance improvement of 8% to 10% at the same voltage and complexity, or a 15% to 20% reduction in power consumption at the same frequency and transistor count. TSMC is not listing detailed density parameters this far out, but the company says that chip density will increase by 1.07x to 1.10x – keeping in mind that transistor density heavily depends on the type and libraries of transistors used.

The key innovation of TSMC's A16 node, is its Super Power Rail (SPR) backside power delivery network, a first for TSMC. The contract chipmaker claims that A16's SPR is specifically tailored for high-performance computing products that feature both complex signal routes and dense power circuitry.

As noted earlier, with this week's announcement, A16 has now become the launch vehicle for backside power delivery at TSMC. The company was initially slated to offer BSPDN technology with N2P in 2026, but for reasons that aren't entirely clear, the tech has been punted from N2P and moved to A16. TSMC's official timing for N2P in 2023 was always a bit loose, so it's hard to say if this represents much of a practical delay for BSPDN at TSMC. But at the same time, it's important to underscore that A16 isn't just N2P renamed, but rather it will be a distinct technology from N2P.

TSMC is not the only fab pursuing backside power delivery, and accordingly, we're seeing multiple variations on the technique crop up at different fabs. The overall industry has three approaches for BSPDN: Imec's Buried Power Rail, Intel's PowerVia, and now TSMC's Super Power Rail.

The oldest technique, Imec's Buried Power Rail, essentially places power delivery network on the backside of the wafer and then connects power rail of logic cells to power contact using nano TSVs. This enables some area scaling and does not add too much complexity to production. The second implementation, Intel's PowerVia, connects power to the cell or transistor contact, which provides a better result, but at the cost of complexity.

Finally, we have TSMC's new Super Power Rail BSPDN technology, which connects a backside power network directly to each transistor's source and drain. According to TSMC, this is the most efficient technology in terms of area scaling, but the trade-off is that it's the most complex (and expensive) when it comes to production.

That TSMC has opted to go with the most complex version of BSPDN may be part of the reason that we've seen it removed from N2P, as implementing it will ultimately add to both time and costs. This leaves A16 as TSMC's premiere performance node for the 2026/2027 time-frame, while N2P can be positioned to offer a more balanced combination of performance and cost efficiency.

Angstrom Era Kicks Off In Late 2026 With New Node Naming Convention

Finally, as with Intel, we're also seeing TSMC adopt a new process node naming convention starting with this generation of technology. The name itself is largely arbitrary – and this has already been the case in the fab industry for several years now – but with current node names already in the single digits (e.g. N2), the industry has needed to re-calibrate node names to something smaller than the nanometer. And thus we've arrived at the 'angstrom era.' But regardless of what exactly it's called or why it's called that, the important point is that A16 will be the next generation node beyond TSMC's 2nm-class products.

TSMC expects to start volume production on A16 in H2 2026, so it is likely that the first products based on this technology will hit the market in 2027. Given the timing, the production node will presumably compete against Intel's 14A; though at 2+ years out and with no one producing BSPDN in volume today, there's still a lot of time for plans and roadmaps to change.

Taiwan Semiconductor Manufacturing Co. this week released its financial results for Q1 2024. Due to a rebound in demand for semiconductors, the company garned $18.87 billion in revenue for the quarter, which is up 12.9% year-over-year, but a decline of 3.8% quarter-over-quarter. The company says that in increase in demand for HPC processors (which includes processors for AI, PCs, and servers) drove its revenue rebound in Q1, but surprisingly, revenue share of TSMC's flagship N3 (3nm-class) process technology declined steeply quarter-over-quarter.

"Our business in the first quarter was impacted by smartphone seasonality, partially offset by continued HPC-related demand," said Wendell Huang, senior VP and chief financial officer of TSMC. "Moving into second quarter 2024, we expect our business to be supported by strong demand for our industry-leading 3nm and 5nm technologies, partially offset by continued smartphone seasonality."

In the first quarter of 2024, N3 wafer sales accounted for 9% of the foundry's revenue, down from 15% in Q4 2023, and up from 6% in Q3 2023. In terms of dollars, TSMC's 3nm production brought in around $1.698 billion, which is lower than $2.943 billion in the previous quarter. Meanwhile, TSMC's other advanced process technologies increased their revenue share: N5 (5 nm-class) accounted for 37% (up from 35%), and N7 (7 nm-class) commanded 19% (up from 17%). Though both remained relatively flat in terms of revenue, at $6.981 billion and $3.585 billion, respectively.

Generally, advanced technology nodes (N7, N5, N3) generated 65% of TSMC's revenue (down 2% from Q4 2023), while the broader category of FinFET-based process technologies contributed 74% to the company's total wafer revenue (down 1% from the previous quarter).

TSMC itself attributes the steep decline of N3's contribution to seasonally lower demand for smartphones in the first quarter as compared to the fourth quarter, which may indeed be the case as demand for iPhones typically slowdowns in Q1. Along those lines, there have also been reports about a drop in demand for the latest iPhones in China.

But even if A17 Pro production volumes are down, Apple remains TSMC's lead customer for N3B, as the fab also produces their M3, M3 Pro, and M3 Max processors on the same node. These SoCs are larger in terms of die sizes and resulting costs, so their contribution to TSMC's revenue should be quite substantial.

"Moving on to revenue contribution by platform. HPC increased 3% quarter-over-quarter to account for 46% of our first quarter revenue," said Huang. "Smartphone decreased 16% to account for 38%. IoT increased 5% to account for 6%. Automotive remained flat and accounted for 6%, and DCE increased 33% to account for 2%."

Meanwhile, as demand for AI and HPC processors will continue to increase in the coming years, TSMC expects its HPC platform to keep increasing its share in its revenue going forward.

"We expect several AI processors to be the strongest driver of our HPC platform growth and the largest contributor in terms of our overall incremental revenue growth in the next several years," said C.C. Wei, chief executive of TSMC.

This week ASML is making two very important announcements related to their progress with high numerical aperature extreme ultraviolet lithography (High-NA EUV). First up, the company's High-NA EUV prototype system at its fab in Veldhoven, the Netherlands, has printed the first 10nm patterns, which is a major milestone for ASML and their next-gen tools. Second, the company has also revealed that it's second High-NA EUV system is now out the door as well, and has been shipped to an unnamed customer.

"Our High-NA EUV system in Veldhoven printed the first-ever 10 nanometer dense lines," a statement by ASML reads. "Imaging was done after optics, sensors and stages completed coarse calibration. Next up: bringing the system to full performance. And achieving the same results in the field."

Our High NA EUV system in Veldhoven printed the first-ever 10 nanometer dense lines. ✨ Imaging was done after optics, sensors and stages completed coarse calibration.

Next up: bringing the system to full performance. And achieving the same results in the field. ⚙️ pic.twitter.com/zcA5V0ScUf

— ASML (@ASMLcompany) April 17, 2024

Alongside the system shipped to Intel at the end of 2023, ASML has retained their own Twinscan EXE:5000 scanner at their Veldhoven, Netherlands, facility, which is what the company is using for further research and development into High-NA EUV. Using that machine, the company has been able to print dense lines spaced 10 nanometers apart, which is a major milestone in photolithography development. Previously, only small-scale, experimental lab machines have been able to achieve this kind of a resolution. Eventually, High-NA EUV tools will achieve a resolution of 8 nm, which will be instrumental to build logic chips on technologies beyond 3 nm.

Intel's Twinscan EXE:5000 scanner at its D1X fab near Hillsboro, Oregon is also close behind, and its assembly is said to be nearing completion. That machine will be primarily used for Intel's own High-NA EUV R&D, with Intel slated to use its successor — the commercial-grade Twinscan EXE:5200 — to produce its chips on its Intel 14A (1.4 nm-class) in mass quantities in 2026 – 2027.

But Intel will not be the only chipmaker that gets to experiment with a High-NA EUV scanner for very long. As revealed by ASML, the company recently started shipping another Twinscan EXE:5000 machine to yet another customer. The fab tool maker is not disclosing the client, but previously it has said that all of leading logic and memory producers are in the process of procuring High-NA tools for R&D purposes, so the list of 'suspects' is pretty short.

"Regarding High-NA, or 0.55 NA EUV, we shipped our first system to a customer and this system is currently under installation," said Christophe Fouquet, chief business officer of ASML, at the company's earnings conference call with analysts and investors. "We started to ship the second system this month and its installation is also about to start."

While Intel plans to adopt High-NA EUV tools ahead of the industry, other chipmakers seem to a bit more cautious and plan to rely on risky yet already known Low-NA EUV double patterning method for production a 3 nm and 2 nm. Still, regardless of the exact timing for a transition, all of the major fabs will be relying on High-NA EUV tools in due time. So all parties have an interest in how ASML's R&D turns out.

"The customer interest for our [High-NA] system lab is high as this system will help both our Logic and Memory customers prepare for High-NA insertion into their roadmaps," said Fouquet. "Relative to 0.33 NA, the 0.55 NA system provides finer resolution enabling an almost 3x increase in transistor density, at a similar productivity, in support of sub-2nm Logic and sub-10nm DRAM nodes."

Sources: ASML/X, ASML, Reuters

Samsung Electronics this week was awarded up to $6.4 billion from the U.S. government under the CHIPS and Science Act to build its new fab complex in Taylor, Texas. This is the third major award under the act in the last month, with all three leading-edge fabs – Intel, TSMC, and now Samsung – receiving multi-billion dollar funding packages under the domestic chip production program. Overall, the final price tag on Samsung's new fab complex is expected to reach $40 billion by the time it's completed later this decade.

Samsung's CHIPS Act funding was announced during a celebratory event attended by U.S. Secretary of Commerce Gina Raimondo and Samsung Semiconductor chief executive Kye Hyun Kyung.  During the event, Kyung outlined the strategic goals of the expansion, emphasizing that the additional funding will not only increase production capacity but also strengthen the entire local semiconductor ecosystem. Samsung plans to equip its fab near Taylor, Texas, with the latest wafer fab tools to produce advanced chips. The Financial Times reports that Samsung aims to produce semiconductors on its 2nm-class process technology starting 2026, though for now this is unofficial information.

"I am pleased to announce a preliminary agreement between Samsung and the Department of Commerce to bring Samsung's advanced semiconductor manufacturing and research and development to Texas," said Joe Biden, the U.S. president, in a statement. "This announcement will unleash over $40 billion in investment from Samsung, and cement central Texas's role as a state-of-the-art semiconductor ecosystem, creating at least 21,500 jobs and leveraging up to $40 million in CHIPS funding to train and develop the local workforce. These facilities will support the production of some of the most powerful chips in the world, which are essential to advanced technologies like artificial intelligence and will bolster U.S. national security."

Samsung has been a significant contributor to the Texas economy for decades, starting chip manufacturing in the U.S. in 1996. With previous investments totaling $18 billion in its Austin operations, Samsung's expansion into Taylor with an additional investment of at least $17 billion underscores its role as one of the largest foreign direct investors in U.S. history. The total expected investment in the new fab surpasses $40 billion, making it one of the largest for a greenfield project in the nation and transforming Taylor into a major hub for semiconductor manufacturing.

The CEO highlighted the substantial economic impact of Samsung's operations, noting a nearly double increase in regional economic output from $13.6 billion to $26.8 billion between 2022 and 2023. The ongoing expansion is projected to further stimulate economic growth, create thousands of jobs, and enhance the community's overall development.

“We are not just expanding production facilities; we’re strengthening the local semiconductor ecosystem and positioning the U.S. as a global semiconductor manufacturing destination.” said Kyung. “To meet the expected surge in demand from U.S. customers, for future products like AI chips, our fabs will be equipped for cutting-edge process technologies and help bring security to the U.S. semiconductor supply chain.”

Samsung is also committed to environmental sustainability and workforce development. The company plans to operate using 100% clean energy and incorporate advanced water management technologies. Additionally, it is investing in education and training programs to develop a new generation of semiconductor professionals. These initiatives include partnerships with educational institutions and programs tailored for military veterans.

In his remarks, Kyung expressed gratitude to President Biden, Secretary Raimondo, and other governmental and community supporters for their ongoing support. This collaborative effort between Samsung and various levels of government, as well as the local community, is pivotal in advancing America's semiconductor industry and ensuring its global competitiveness.

"Today’s announcement will help Samsung bring more semiconductor production, innovation, and jobs to U.S. shores, reinforcing America’s economy, competitiveness, and critical chip supply chains," a statememt by the Semiconductor Industry Associate reads. "We applaud Samsung for investing boldly in U.S.-based manufacturing and salute the U.S. Commerce Department for making significant headway in implementing the CHIPS Act’s manufacturing incentives and R&D programs. We look forward to continuing to work with leaders in government and industry to ensure the CHIPS Act remains on track to help reinvigorate U.S. chip manufacturing and research for many years to come."

TSMC has entered into a preliminary agreement with the U.S. Department of Commerce, securing up to $6.6 billion in direct funding and access to up to $5 billion in loans under the CHIPS and Science Act. With this latest round of support from the U.S. government, TSMC in turn will be adding a third fab to their Arizona project, with its investment in the region soaring to more than $65 billion. This move not only signifies the largest foreign direct investment in Arizona but also marks one of the biggest support packages that the U.S. government plans to make under the CHIPS Act, second only to Intel's $8.5 billion award last month.

TSMC is currently equipping its Fab 21 phase 1 and expects that it will start making chips using N4 and N5 (4 nm and 5 nm-class) process technologies in the first half of 2025. TSMC's Fab 21 phase 2 will commence operations in 2028, and will make chips on N3 and N2 (3 nm and 2 nm-class) production nodes. The newly-announced third fab (designation TBD) is set to manufacture chips on processes of 2 nm-class or beyond, with the start of production anticipated by the end of the decade.

TSMC has not announced a planned capacity for the new fab, only noting that it will be similar to the other two Arizona fabs, boasting a cleanroom space roughly twice as large as that of a typical "industry-standard logic fab." If it is sized similarly to the other Arizona fabs, then this strongly implies that the new fab will be another MegaFab-class facility – a mid-range fab producing around 25,000 wafer starts per month. TSMC does operate even larger fabs – the 100K WSPM GigaFab – though to date they've yet to build any of these outside of Taiwan.

“The CHIPS and Science Act provides TSMC the opportunity to make this unprecedented investment and to offer our foundry service of the most advanced manufacturing technologies in the United States,” said TSMC Chairman Dr. Mark Liu. “Our U.S. operations allow us to better support our U.S. customers, which include several of the world’s leading technology companies. Our U.S. operations will also expand our capability to trailblaze future advancements in semiconductor technology.”

The construction of three fabs in Arizona is poised to generate approximately 6,000 direct high-tech jobs, contributing significantly to the creation of a skilled workforce. This workforce is expected to play a crucial role in fostering a dynamic and competitive global semiconductor ecosystem. Moreover, the project is projected to create over 20,000 construction jobs, in addition to spawning tens of thousands of indirect jobs related to suppliers and consumer services.

AMD, Apple, and NVIDIA fully support TSMC's project and all of them expressed interest in using TSMC's capacities in the U.S.

“Today’s announcement highlights the strong commitment from Secretary Raimondo and the entire administration to ensure the U.S. plays a central role creating a more geographically diverse and resilient semiconductor supply chain,” said AMD Chair and CEO Lisa Su. “TSMC has a long track record of providing the leading-edge manufacturing capabilities that have enabled AMD to focus on what we do best, designing high-performance chips that change the world. We are committed to our partnership with TSMC and look forward to building our most advanced chips in U.S.”

TSMC's ventures in Arizona have encountered obstacles, such as setbacks caused by labor shortages and doubts about the U.S. governmental funding. As a result, production at the second facility has been postponed from 2026 to 2028. Moreover, Bloomberg has reported that at least one supplier for TSMC has called off its intended project in Arizona, attributing the decision to challenges in securing a workforce. The address the workforce issues, the TSMC grant includes a $50 million allocation for training of the local workforce.

Sources: TSMC, Bloomberg

Rapidus, a Japan-based company developing 2nm process technology and aiming to commercialize it in 2027, will receive a huge government grant for its ongoing projects. The Japanese government will support Rapidus with subsidies totaling ¥590 billion yen ($3.89 billion). In addition to developing its 2nm production node and spending on cleanroom equipment, Rapidus will also fund the development of multi-chiplet packaging technology.

This extra funding will significantly help the company's ambitious plans. With the government's total support now at ¥920 billion ($6.068 billion), Rapidus is getting a solid push to become a significant player in the semiconductor industry. The whole project is expected to cost around ¥5 trillion ($32.983 billion), so the funding is not quite there yet. Meanwhile, the company may get enough financing with support from the Japanese government and large Japanese conglomerates like Toyota Motor and Nippon Telegraph and Telephone.

According to Atsuyoshi Koike, Rapidus's chief executive, the company is on track to start testing its production by April 2025 and aims to begin large-scale production by 2027. Commercial production of 2nm chips is set to commence sometime in 2025.

In addition to developing its 2nm fabrication process in collaboration with IBM and building its manufacturing facility, Rapidus is also working on advanced packaging technology for multi-chiplet system-in-packages (SiPs). The latest government subsidies include more than ¥50 billion ($329.85 million) for research and development in this area, the first time Japan has provided subsidies for such technologies.

It is noteworthy that Rapidus will use a section of Seiko Epson Corporation's Chitose Plant (located in Chitose City, Hokkaido) for its back-end packaging processes. This plant is near the company's fab, which is currently being built in Bibi World, an industrial park in Chitose City. This space will be dedicated to pilot-stage research and development activities.

Sources: Rapidus, Nikkei

Intel and the United States Department of Commerce announced on Wednesday that they had inked a preliminary agreement under which Intel will receive $8.5 billion in direct funding under the CHIPS and Science Act. Furthermore, Intel is being made eligible for $11 billion in low-interest loans under the same law, and is being given access to a 25% investment tax credit on up to $100 billion of capital expenditures over the next five years. The funds from the long-awaited announcement will be used to expand or build new Intel's semiconductor manufacturing plants in Arizona, New Mexico, Ohio, and Oregon, potentially creating up to 30,000 jobs.

"Today is a defining moment for the U.S. and Intel as we work to power the next great chapter of American semiconductor innovation," said Intel CEO Pat Gelsinger. "AI is supercharging the digital revolution and everything digital needs semiconductors. CHIPS Act support will help to ensure that Intel and the U.S. stay at the forefront of the AI era as we build a resilient and sustainable semiconductor supply chain to power our nation's future."

Intel is working on several important projects, including new semiconductor production facilities and advanced packaging facilities. On the fab front, there are three ongoing projects: 

• Firstly, Intel is expanding its chip production capacities in Arizona — the Silicon Desert campus — by constructing two additional fab modules capable of making chips on Intel 18A and 20A production technologies at a projected cost of around $20 billion. 
• Secondly, the company is building its all-new Silicon Heartland campus in Licking County, near Columbus, Ohio. This extensive project is anticipated to require a total investment of $100 billion or more when fully developed, with an initial investment of around $20 billion for the first two fabrication modules, which are set to be completed in 2027 – 2028. 
• Thirdly, Intel is expanding and upgrading its chip production, research, and development capabilities in its Silicon Forest campus near Hillsboro, Oregon. In particular, the company recently began installing a $380 million High-NA EUV tool in its D1X fab in Oregon.

Regarding advanced packaging facilities, Intel is about to complete the conversion of two of its fabs in its Silicon Mesa campus in New Mexico to advanced packaging facilities. These facilities will be crucial to building next-generation multi-chipset processors for clients, data center, and AI applications in the coming years, and which will be the largest advanced packaging operation in the US. Meanwhile, with advanced packaging capacity in New Mexico already in place, the state is set to concentrate vast advanced packaging capabilities to support Intel's ramp of leading-edge fabs in Arizona, Ohio, and Oregon.

To receive both the $8.5 billion in direct funding and the $11 billion in low-interest, long-term loans, Intel must comply with the terms set in the so-called preliminary memorandum of terms (PMTs). The PMT specifies that receiving direct funding and federal loans will only be provided after thoroughly reviewing and negotiating detailed agreements. These financial awards also depend on meeting specific milestone goals, which are not public, but are thought to include terms concerning investments, timing, and workforce developments. Finally, all of this funding is subject to the availability of remaining CHIPS Act funds.

On top of this direct financial assistance, if Intel meets the U.S. government's requirements, it can also access a 25% tax credit on up to $100 billion of qualified capital expenditures over the next five years. This will make Intel's CapEx – the most expensive part of building and outfitting a chip fab – 'cheaper' for the company and stimulate it to invest in the U.S.

"With this agreement, we are helping to incentivize over $100 billion in investments from Intel – marking one of the largest investments ever in U.S. semiconductor manufacturing, which will create over 30,000 good-paying jobs and ignite the next generation of innovation," said U.S. Secretary of Commerce Gina Raimondo. "This announcement is the culmination of years of work by President Biden and bipartisan efforts in Congress to ensure that the leading-edge chips we need to secure our economic and national security are made in the U.S."

Last year, NVIDIA introduced its cuLitho software library, which promises to speed up photomask development by up to 40 times. Today, NVIDIA announced a partnership with TSMC and Synopsys to implement its computational lithography platform for production use, and use the company's next-generation Blackwell GPUs for AI and HPC applications.

The development of photomasks is a crucial step for every chip ever made, and NVIDIA's cuLitho platform, enhanced with new generative AI algorithms, significantly speeds up this process. NVIDIA says computational lithography consumes tens of billions of hours per year on CPUs. By leveraging GPU-accelerated computational lithography, cuLitho substantially improves over traditional CPU-based methods. For example, 350 NVIDIA H100 systems can now replace 40,000 CPU systems, resulting in faster production times, lower costs, and reduced space and power requirements.

NVIDIA claims its new generative AI algorithms provide an additional 2x speedup on the already accelerated processes enabled through cuLitho. This enhancement is particularly beneficial for the optical proximity correction (OPC) process, allowing the creation of near-perfect inverse masks to account for light diffraction.

TSMC says that integrating cuLitho into its workflow has resulted in a 45x speedup of curvilinear flows and an almost 60x improvement in Manhattan-style flows. Curvilinear flows involve mask shapes represented by curves, while Manhattan mask shapes are restricted to horizontal or vertical orientations.

Synopsys, a leading developer of electronic design automation (EDA), says that its Proteus mask synthesis software running on the NVIDIA cuLitho software library has accelerated computational workloads compared to current CPU-based methods. This acceleration is crucial for enabling angstrom-level scaling and reducing turnaround time in chip manufacturing.

The collaboration between NVIDIA, TSMC, and Synopsys represents a significant advancement in semiconductor manufacturing in general and cuLitho adoption in particular. By leveraging accelerated computing and generative AI, the partners are pushing semiconductor scaling possibilities and opening new innovation opportunities in chip designs.