The Delta Emulator Is Changing Its Logo After Adobe Threatened It
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Although TSMC can't claim to be the first fab to use extreme UV (EUV) lithography – that title goes to Samsung – they do get to claim to be the largest. As a result, the company has developed significant experience with EUV over the years, allowing TSMC to refine how they use EUV tooling to both improve productivity/uptime, and to cut down on the costs of using the ultra-fine tools. As part of the company's European Technology Symposium this week, they went into a bit more detail on their EUV usage history, and their progress on further integrating EUV into future process nodes.
When TSMC started making chips using EUV lithography in 2019 on its N7+ process (for Huawei's HiSilicon), it held 42% of the world's installed base of EUV tools, and even as ASML ramped up shipments of EUV scanners in 2020, TSMC's share of EUV installations actually increased to 50%. And jumping ahead to 2024, where the number of EUV litho systems at TSMC has increased by 10-fold from 2019, TSMC is now 56% of the global EUV installed base, despite Samsung and Intel ramping up their own EUV production. Suffice it to say, TSMC made a decision to go in hard on EUV early on, and as a result they still have the lion's share of EUV scanners today.
Notably, TSMC's EUV wafer production has increased by an even larger factor; TSMC now pumps out 30 times as many EUV wafers as they did in 2019. Compared to the mere 10x increase in tools, TSMC's 30x jump in production underscores how TSMC has been able to increase their EUV productivity, reduce service times, and fewer tool downtimes overall. Apparently, this has all been accomplished using the company's in-house developed innovations.
TSMC's Leadership in EUV High Volume Manufacturing Data by TSMC (Compiled by AnandTech) |
||||
2019 | 2023 | |||
Cumulative Tools | 1X | 10X | ||
Share of Global EUV Installed Base | 42% | 56% | ||
EUV Wafer Output | 1X | 30X | ||
Wafer per Day per EUV Tool | 1X | 2X | ||
Reticle Particle Contamination | 1X | 0.1X |
TSMC says that it has managed to increase wafer-per-day-per-tool productivity of its EUV systems by two times since 2019. To do so, the company optimized the EUV exposure dose and the photoresist it uses. In addition, TSMC greatly refined its pellicles for EUV reticles, which increased their lifespan by four times (i.e., increases uptime), increased output per pellicle by 4.5 times, and lowered defectivity by massive 80 times (i.e., improves productivity and increases uptime). For obvious reasons, TSMC does not disclose how it managed to improve its pellicle technology so significantly, but perhaps over time the company's engineers are going to share this with academia.
TSMC's EUV Pellicle Technology vs. Commercial Data by TSMC (Compiled by AnandTech) |
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Commercial | TSMC (Claimed) | |||
Output | 1X | 4.5X | ||
Defectivity | 1X | 0.0125X | ||
Lifespan | 1X | 4X |
EUV lithography systems are also notorious for their power consumption. So, in addition to improving productivity of EUV tools, the company also managed to reduce the power consumption of its EUV scanners by 24% through undisclosed 'innovative energy saving techniques.' And the company isn't done there: they are planning to improve energy efficiency per wafer per EUV tool by 1.5 times by 2030.
Considering all the refinements that TSMC has managed to achieve with Low-NA EUV lithography by now, it is not terribly surprising that the company is quite confident that it can continue to produce cutting-edge chips in the future. Whereas rival Intel has gone all-in on High-NA EUV for their future, sub-18A nodes, TSMC is looking to leverage their highly-optimized and time-tested Low-NA EUV tooling instead, avoiding the potential pitfalls of a major technology transition so soon while also reaping the cost benefits of using the well-established tooling.
Founded in 1980 and headquartered in Taiwan, Sunon (aka Sunonwealth Electric Machine Industry Co., Ltd.), stands out as a prominent global producer of fans, blowers, and thermal management systems. The company has made a name for itself in the fan industry with a comprehensive product line that includes DC brushless fans, micro blowers, CPU coolers, and various other cooling technologies. They are one of the oldest and most renowned fan manufacturers on the world – and not just for PC applications, but for just about anything in need of something smaller than a ceiling fan, spanning from IT to automotive and industrial sectors.
Within the PC space, the company is best known for its proprietary MagLev (Magnetic Levitation) technology, which uses magnetic forces to levitate the rotor shaft, drastically reducing friction and wear. This innovative design improves the durability and performance of their fans, particularly in reducing operational noise and improving high-temperature performance. Sunon introduced the patent and their first MagLev products all the way back in 90s.
The 120mm Sunon MagLev fan that we are reviewing today – MFC0251V2-1Q02U-S99 – is a new, high-performance fan engineered primarily for PC applications, with an emphasis on longevity and functionality. It features Sunon's advanced Vapo-Bearing MagLev Engine, which allegedly ensures a quieter operation and longer lifespan by minimizing friction. This particular fan has a maximum speed of 1900 RPM and all of the bells and whistles of advanced cooling fans, including a wide range PWM speed control (10-100%).
Distinguished by its crisp white color and unique frame design, this fan is aimed PC builders going for a clean and modern aesthetic. The "gaming" designation by the manufacturer clearly divulges their intentions regarding their targeted audience. By default, these fans have both a 4-pin connector and also a Molex connector for their direct connection to the PSU.
We are testing fans using an Extech HD350 differential manometer, an Extech AN200 velocity meter, and a custom 3D printed apparatus designed for this specific purpose. The apparatus features a simple but effective shutters mechanism that allows us to test the unobstructed (maximum) volume flow of a fan, the fully obstructed (maximum static) pressure of the fan, and multiple points in between, allowing us to compose the actual P-Q performance chart of any fan. The RPM reading is taken with the fan unobstructed (maximum flow), as the fan speed varies depending on the airflow impedance in conjunction with the design of the fan’s blades.
For noise measurements, we are using an Extech HD600 high sensitivity SPL meter. The noise of the fan is measured from 15 centimeters away, not one meter as IEC certifications require, as that would be far too great a distance to measure differences between nearly silent products. Note however that we are measuring the noise level of a fan with its flow unobstructed and the fan, to the best possible degree, uncoupled from the environment. The addition of fan grills, the installation on a cooler, and any other form of obstruction will increase the generated noise, as both aerodynamic and vibration noise will be added into the environment.
The Sunon MFC0251V2-1Q02U-S99 is a robust performer across the entirety of the performance chart. At its maximum speed of 1900 RPM, it offers an airflow of 58.9 CFM and a static pressure of 2.48 mmH2O. However, that performance comes with a noise output of 41.3 dB(A), which is quite noticeable and, in most cases, not really ahead of its competition. When compared to the Corsair ML120, another fan with a magnetic levitation engine, the Sunon model tends to offer significantly better performance by running about 300 RPM faster while generating about the same level of noise.
Overall, Sunon's 120mm MagLev fan stands out as a high-quality part, and better still it's priced competitively at around $11, offering substantial value for those looking for robust cooling solutions within budget constraints. When it's used correctly, the fan easily competes with, and generally outperforms, the best 120 mm products currently available – albeit not immensely so.
However "used correctly" is the operative term, as the MagLev engine makes the fan particular about its orientation. In short, these fans are not meant to be installed with the engine facing upwards, as this can jeopardize the integrity of the Vapo mechanism. As a result, Sunon's MagLev fan is really only good for horizontal uses – front and back air intake/exhaust – and shouldn't be used for vertical configurations at the top and bottom of computer cases.
Despite that, the 120mm MagLev fan does excel when it's in its niche, especially at its price. The biggest hurdle, in that case, is just acquiring a fan, as Sunon is primarily geared up to target the bulk OEM market and doesn't sell their fans in individual retail units. So prospective buyers will need to skip the Neweggs and Amazons of the world, and look instead at electronic and industrial suppliers like Digikey and Mouser.
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Les 46 États membres du Conseil de l’Europe ont adopté la Convention-cadre sur l’intelligence artificielle, premier traité international juridiquement contraignant en la matière.
Respect de l’autonomie personnelle, obligations de transparence et contrôles adaptés au contexte, obligation de rendre des comptes en cas d’impacts négatifs des systèmes d’intelligence artificielle sur les droits humains, la démocratie ou l’État de droit… Le Conseil de l’Europe a adopté ce 17 mai sa Convention-cadre « sur l’intelligence artificielle et les droits de l’homme, la démocratie et l’État de droit ».
Il s’agit, en matière d’intelligence artificielle, du premier texte d’ampleur internationale qui soit juridiquement contraignant. Le texte a été adopté pendant la réunion ministérielle annuelle du Comité des ministres du Conseil de l’Europe, qui rassemble les ministres des Affaires Étrangères des 46 États membres (parmi lesquels les 27 pays de l’Union, mais aussi des États comme la Suisse, la Norvège ou la Turquie).